STS Multiplex PECVD , configured for deposition of SiO2 and Si3N4.
- Automatic Load Lock up to substrate size of 8”.
- Pumping system including Dual stage Rotary and Roots pumps, compatible with process chemistry.
- 13,56 Mhz RF generator and 500Watt LF generator, useable in ” Mixed Frequency” mode for Si3N4 stress control..
- Automatic Matching Network for RF .
- 7 process gas lines with Mass Flow Controllers, pneumatic valves and inline filters.
- Heated lower electrode up to 350°C, 240 mm diameter and Pin Lift for substrate loading.
- Heated gas shower head.
- Heated chamber walls.
- View Port for plasma analysis and End Point Detection.
- Capacitance Manometer for process pressure.
- APC Throttle valve.
- Closed loop chiller
- Process controller based on 486 PC and MS DOS based control Software .
- Input power 380/220 Vac.
This system has been refurbished and it is in working condition.
Pumps will be refurbished before delivery.
Price of the system: 90.000 Euro (excluding any tax and transportation)
Warranty: 3 months on parts.
Our engineers will assist remotely local engineers in fault-finding.
Any defective part should be shipped back to Gambetti for repair.
On site service would be charged at agreed intercompany rates.
To be agreed.